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Sputtering target for TFT-LCD

Sputtering target for TFT-LCD

Flat Panel Display Planar Sputtering Target

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The advantages of TFT-LCD are less energy consumption, high brightness and low response time. TTMC provide high purity and quality of Al, Mo, Cu, Ti targets for TFT-LCD and AM-OLED industries. Meanwhile, we well manage the material resource and improve technology to ensure the product quality and meet customers’ requirement for large size TFT-LCD panel which lead TTMC to high market share of sputtering target industry.。

 

Application 

  • Drive Electrode: Al (5N), Al alloy, Cr, Ti, Mo, Cu.
  • Black Matrix: Cr
  • Transparent Electrode: ITO (In2O3-SnO2)(In2O3-SnO2)
  • Diffuser material: Mo, Cr
  • Dielectric material: Al2O3 , SiO2

 

Product Advantages 

  • Well management of high purity raw material resource and processing,fully in-house and quality control.
  • High market share and stable supply for generation 1 to 10.5 TFT-LCD panel
  • High strength special bonding metal.
  • Planar and rotary sputtering target synchronized supply.

 

Glass substrate size and sputtering target

 
Gen Glass substrate size (mm) Target size(mm)
G3.5 610x720; 620x750 890x980
G4 680x880 980x1150
G5 1100x1300 1431x1700
G5.5 1300x1500 1580x1950
G6 1500x1850

200x2300

8 segments

G7.5 1950x2250

180x2650

12 segments

G8.5 2200x2500

185x2650

14 segments

G10 2880x3130

238x3400

16 segments

G10.5 2940x3370

300x3430

16 segments

Main Products

Thin film sputtering tube/ plate target, metal powder for 3D printing, acid and alkali-resistance alloy and titanium for cooking/ tableware. Sputtering target bonding, precious metal recycling, Vacuum hot pressing sintering, forging and analysis

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